TY - JOUR T1 - Shallow phosphorus diffusion profiles in silicon JF - Proceedings of the IEEE Y1 - 1969 VL - 57 UR - http://ieeexplore.ieee.org/document/1449255/http://xplorestaging.ieee.org/ielx5/5/31124/01449255.pdf?arnumber=1449255 CP - 9 J1 - Proc. IEEE KW - Tsai1969 ER -